Effect of Annealing Rates on Surface Roughness of TiO2 Thin films

Show simple item record

dc.contributor.author John, Benjamin M.
dc.contributor.author Mugo, Simon W.
dc.contributor.author Ngaruiya, James M.
dc.date.accessioned 2019-01-07T09:54:51Z
dc.date.available 2019-01-07T09:54:51Z
dc.date.issued 2018
dc.identifier.citation Journal of Materials Physics and Chemistry, 2018, Vol. 6, No. 2, 43-46 en_US
dc.identifier.uri http://pubs.sciepub.com/jmpc/6/2/3/
dc.identifier.uri http://repository.seku.ac.ke/handle/123456789/4306
dc.description DOI:10.12691/jmpc-6-2-3 en_US
dc.description.abstract In this work, we report a simple and novel method of determining the morphological properties of TiO2 thin films synthesized by sol-gel doctor-blade method. The TiO2 films were deposited on doped fluorine tin oxide (SnO2:F) layer on glass substrates. The as-deposited and subsequent annealed films at different rates (1-step annealing, 1°C/min and 2°C/min) were studied using optical microscopy. Analysis of the optical images through line scans and histogram distributions, revealed the average surface roughness to be 0.1246±0.0114, 0.1442±0.0069, 0.1393±0.0084, and 0.1333±0.0084μm for the as-deposited, 1-step annealed, 2°C/min, and 1°C/min films, respectively. The average sizes of islands forming on the films were found to be 0.1037± 0.0054, 0.1262±0.0053, 0.1684±0.0103, and 0.1947±0.0078μm for the as-deposited, 1-step annealed, 2°C/min, and 1°C/min films, respectively. A striking statistical correlation between surface roughness and annealing rate was established, with the 1°C/min annealed film having the lowest roughness and the largest size of islands. This is attributed to the dynamics of crystallization where TiO2have more time to partially melt and coalesce into relatively smooth surface at low annealing rate, in contrast to high rates. Our results clearly demonstrate that the surface roughness on TiO2 films heat-treated at different temperatures can be accurately and rapidly determined based on their optical contrast. en_US
dc.language.iso en en_US
dc.publisher Science and Education Publishing en_US
dc.subject TiO2 en_US
dc.subject optical image en_US
dc.subject surface roughness en_US
dc.subject morphology en_US
dc.title Effect of Annealing Rates on Surface Roughness of TiO2 Thin films en_US
dc.type Article en_US


Files in this item

This item appears in the following Collection(s)

Show simple item record

Search Repository


Browse

My Account